DocumentCode :
1629308
Title :
Improve variability in carbon nanotube FETs by scaling
Author :
Sun, Yanning ; Tuleski, George ; Han, Shu-Jen ; Haensch, Wilfried ; Chen, Zhihong
Author_Institution :
IBM T.J. Watson Res. Center, Yorktown Heights, NY, USA
fYear :
2010
Firstpage :
283
Lastpage :
284
Abstract :
Carbon nanotube transistors are shown to have large performance variation due to their diameter variation, which is not acceptable to VLSI technology. We demonstrate that by proper scaling we can reach >2 mA/μm on-state current in 90% of our nanotube devices. More importantly, we demonstrate proper scaling can reduce the current variation by 2 orders of magnitude and mitigate the impact of tube diameter distribution.
Keywords :
VLSI; carbon nanotubes; field effect transistors; nanotube devices; VLSI technology; carbon nanotube FET; carbon nanotube transistors; field-effect transistors; nanotube devices; tube diameter distribution; CNTFETs; Logic gates; Nanoscale devices; Nanotubes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference (DRC), 2010
Conference_Location :
South Bend, IN
ISSN :
1548-3770
Print_ISBN :
978-1-4244-6562-0
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2010.5551959
Filename :
5551959
Link To Document :
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