• DocumentCode
    1629437
  • Title

    Channel and contact length scaling in carbon nanotube transistors

  • Author

    Franklin, Aaron D. ; Bol, Ageeth A. ; Chen, Zhihong

  • Author_Institution
    IBM T. J. Watson Res. Center, Yorktown Heights, NY, USA
  • fYear
    2010
  • Firstpage
    275
  • Lastpage
    276
  • Abstract
    In summary, results are presented on the effects of Lg and CL scaling in CNTFETs. To consider CNTFETs for a high performance technology, any limitations related to their aggressive scaling must be understood. Devices with excellent and reproducible performance were fabricated with Lg and CL as small as 15 and 20 nm, respectively-projected achievable pitch of 45 nm, which would be suitable beyond the 8 nm technology node. In fact, the smallest CNTFET to date is demonstrated having CL ≈ Lg ≈ 20 nm with superb performance.
  • Keywords
    carbon nanotubes; field effect transistors; CNTFET; aggressive scaling; carbon nanotube transistors; contact length scaling; Ballistic transport; CNTFETs; Contact resistance; Logic gates; Performance evaluation; Resistance; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference (DRC), 2010
  • Conference_Location
    South Bend, IN
  • ISSN
    1548-3770
  • Print_ISBN
    978-1-4244-6562-0
  • Electronic_ISBN
    1548-3770
  • Type

    conf

  • DOI
    10.1109/DRC.2010.5551963
  • Filename
    5551963