DocumentCode
1629437
Title
Channel and contact length scaling in carbon nanotube transistors
Author
Franklin, Aaron D. ; Bol, Ageeth A. ; Chen, Zhihong
Author_Institution
IBM T. J. Watson Res. Center, Yorktown Heights, NY, USA
fYear
2010
Firstpage
275
Lastpage
276
Abstract
In summary, results are presented on the effects of Lg and CL scaling in CNTFETs. To consider CNTFETs for a high performance technology, any limitations related to their aggressive scaling must be understood. Devices with excellent and reproducible performance were fabricated with Lg and CL as small as 15 and 20 nm, respectively-projected achievable pitch of 45 nm, which would be suitable beyond the 8 nm technology node. In fact, the smallest CNTFET to date is demonstrated having CL ≈ Lg ≈ 20 nm with superb performance.
Keywords
carbon nanotubes; field effect transistors; CNTFET; aggressive scaling; carbon nanotube transistors; contact length scaling; Ballistic transport; CNTFETs; Contact resistance; Logic gates; Performance evaluation; Resistance; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference (DRC), 2010
Conference_Location
South Bend, IN
ISSN
1548-3770
Print_ISBN
978-1-4244-6562-0
Electronic_ISBN
1548-3770
Type
conf
DOI
10.1109/DRC.2010.5551963
Filename
5551963
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