DocumentCode :
1629437
Title :
Channel and contact length scaling in carbon nanotube transistors
Author :
Franklin, Aaron D. ; Bol, Ageeth A. ; Chen, Zhihong
Author_Institution :
IBM T. J. Watson Res. Center, Yorktown Heights, NY, USA
fYear :
2010
Firstpage :
275
Lastpage :
276
Abstract :
In summary, results are presented on the effects of Lg and CL scaling in CNTFETs. To consider CNTFETs for a high performance technology, any limitations related to their aggressive scaling must be understood. Devices with excellent and reproducible performance were fabricated with Lg and CL as small as 15 and 20 nm, respectively-projected achievable pitch of 45 nm, which would be suitable beyond the 8 nm technology node. In fact, the smallest CNTFET to date is demonstrated having CL ≈ Lg ≈ 20 nm with superb performance.
Keywords :
carbon nanotubes; field effect transistors; CNTFET; aggressive scaling; carbon nanotube transistors; contact length scaling; Ballistic transport; CNTFETs; Contact resistance; Logic gates; Performance evaluation; Resistance; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference (DRC), 2010
Conference_Location :
South Bend, IN
ISSN :
1548-3770
Print_ISBN :
978-1-4244-6562-0
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2010.5551963
Filename :
5551963
Link To Document :
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