DocumentCode :
1629831
Title :
Thermal effects in oxide TfTs
Author :
Mourey, Devin A. ; Zhao, Dalong A. ; Fok, Ho Him R ; Li, Yuanyuan V. ; Jackson, Thomas N.
Author_Institution :
Center for Thin Film Devices, Penn State Univ., University Park, PA, USA
fYear :
2010
Firstpage :
243
Lastpage :
244
Abstract :
In oxide-based thin films transistors (TFTs) there have been many devices reported with non-negligible output conductance. It has been proposed that the origin of the output conductance may be similar to for short channel Si MOSFETs. However, for these and the vast-majority of published oxide TFTs the channel length is more than 30x longer than the gate oxide thickness, and short channel effect are expected to be small. We have modeled ZnO TFTs with varying channel length using Synopsis Sentaurus, a 2-D drift-diffusion simulation tool, and find only small output conductance for channel lengths in the range typically reported, thus short channel effects cannot account for the output conductance in the reported oxide transistors. We do however find a correlation between input power and output conductance nearly independent of channel length for various oxide devices which suggests that self-heating may be the cause.
Keywords :
thermal analysis; thin film transistors; zinc compounds; 2D drift-diffusion simulation tool; Synopsis Sentaurus; ZnO; output conductance; oxide TFT; oxide-based thin films transistors; thermal effects; Glass; Pulse measurements; Silicon; Substrates; Temperature measurement; Thin film transistors; Zinc oxide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference (DRC), 2010
Conference_Location :
South Bend, IN
ISSN :
1548-3770
Print_ISBN :
978-1-4244-6562-0
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2010.5551976
Filename :
5551976
Link To Document :
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