DocumentCode :
1629875
Title :
Performance improvements in polysilicon source-gated transistors
Author :
Sporea, R.A. ; Trainor, M.J. ; Young, N.D. ; Shannon, J.M. ; Silva, S.R.P.
Author_Institution :
Adv. Technol. Inst., Univ. of Surrey, Guildford, UK
fYear :
2010
Firstpage :
245
Lastpage :
246
Abstract :
The source-gated transistor (SGT) is a new type of transistor in which the current is controlled by a potential barrier at the source and by a gate which modulates the effective height of the source barrier. It is an ideal device architecture to be used with the low mobility materials typically applied to large area electronics, as it provides low saturation voltages and high output impedances. Furthermore, the high internal fields and low concentration of excess carriers lead to higher speed and better stability compared with FETs, particularly in disordered, low mobility semiconductors. As such, the SGT is especially well suited to thin-film analog circuits.
Keywords :
elemental semiconductors; field effect transistors; silicon; thin film circuits; FET; SGT; device architecture; high output impedances; large area electronics; low mobility materials; low mobility semiconductors; low saturation voltages; performance improvements; polysilicon source-gated transistors; potential barrier; source barrier; thin-film analog circuits; Capacitance; Doping; FETs; Frequency response; Logic gates; Metals;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference (DRC), 2010
Conference_Location :
South Bend, IN
ISSN :
1548-3770
Print_ISBN :
978-1-4244-6562-0
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2010.5551977
Filename :
5551977
Link To Document :
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