Atmospheric Pressure Plasma Deposition of Polyfuran

Author

Oksuz, Lutfi ; Gok, Alican

Author_Institution

Suleyman Demirel Univ., Isparta

fYear

2007

Firstpage

848

Lastpage

848

Abstract

Summary form only given. The atmospheric pressure plasma polymerization of furan was carried out with the objective of synthesizing polvfuran film. RF (13.56 MHz) plasma electrical characteristics and optical characteristics are examined. The structure, compositions and morphology of the plasma deposited poly furan film were investigated by Fourier transform infrared (FTIR), atomic force microscopy (AFM), ultravioletvisible absorption spectroscopy (IJV-vis) and thermogravimetric analysis (TGA). The formation of polyfuran was confirmed using FTIR and UV-visible analysis. The properties of plasma-deposited polvfuran were compared with those of chemicallv synthesized polyfuran. Although the plasma deposited polyfuran shows lower thermal stability than that of chemicallv synthesized polyfuran, it has better solubility in common solvents.

Keywords

Fourier transforms; atomic force microscopy; infrared spectra; plasma deposition; polymers; thermal analysis; ultraviolet spectra; Fourier transform infrared; atmospheric pressure plasma deposition; atomic force microscopy; polyfuran; thermal stability; thermogravimetric analysis; ultravioletvisible absorption spectroscopy; Atmospheric-pressure plasmas; Atomic force microscopy; Chemicals; Electric variables; Optical films; Plasma chemistry; Plasma properties; Plasma stability; Polymer films; Radio frequency;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 2007. ICOPS 2007. IEEE 34th International Conference on

Conference_Location

Albuquerque, NM

ISSN

0730-9244

Print_ISBN

978-1-4244-0915-0

Type

conf

DOI

10.1109/PPPS.2007.4346154

Filename

4346154