• DocumentCode
    1631661
  • Title

    New Channel Model for Wireless Communications: Finite-State Phase-Type Semi-Markov Channel Model

  • Author

    Wang, Jinting ; Cai, Jun ; Alfa, Attahiru S.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Manitoba, Winnipeg, MB
  • fYear
    2008
  • Firstpage
    4461
  • Lastpage
    4465
  • Abstract
    In this paper, a finite-state phase-type semi-Markov channel (FSPHMC) model is proposed for wireless channels with correlated fading. By introducing a phase type distributed sojourn time between channel state transitions, the proposed model generalizes the traditional Finite-State Markov Channel (FSMC) model where the sojourn time in each channel state is assumed to satisfy geometric distribution. Thanks to the flexibility of the phase type distribution, the resultant FSPHMC model is applicable to much wider range of practical fading channels. For facilitating the implementation of FSPHMC model in practical scenarios, a special case, FSPHMC model with negative binomial sojourn time (FSPHMC-NB), is also presented under constraint computational complexity. Compared with the traditional FSMC model, the FSPHMC-NB demonstrates considerable improvement in that it matches the true state duration distribution without a significant increase in complexity. Simulation results are given to validate the flexibility and versatility of the proposed FSPHMC model.
  • Keywords
    Markov processes; correlation methods; fading channels; radiocommunication; channel state transition; correlated fading wireless channel; finite-state phase-type semi Markov channel model; negative binomial sojourn time; phase type distributed sojourn time; wireless communication; Communications Society; Computational complexity; Computational modeling; Fading; Information theory; Markov processes; Mathematical model; Signal to noise ratio; Solid modeling; Wireless communication;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Communications, 2008. ICC '08. IEEE International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-2075-9
  • Electronic_ISBN
    978-1-4244-2075-9
  • Type

    conf

  • DOI
    10.1109/ICC.2008.837
  • Filename
    4533873