Title : 
Influence of carrier transport on drain-current variability of MOSFETs
         
        
            Author : 
Ohmori, Kenji ; Shiraishi, Kenji ; Yamada, Keisaku
         
        
            Author_Institution : 
Nanotechnol. Lab., Waseda Univ., Tokyo, Japan
         
        
        
        
        
            Abstract : 
We have investigated static variability of p-MOSFETs by evaluating the drain current under various conditions of gate and drain voltages. The value of drain current variability (σId/Id) is proportional to (LW)-1/2 before the short channel effect appears, being similar to that of Vt variability. The magnitude of σId/Id decreases as the gate overdrive (Vg-Vt) decreases and classified into two regimes that corresponds to the carrier conduction mechanisms, i.e., diffusion and drift transports. This result strongly suggests that the dominant factors for determining σId/Id values are related to the carrier conduction mechanisms.
         
        
            Keywords : 
MOSFET; high-k dielectric thin films; carrier conduction mechanism; carrier transport; diffusion transport; drain current variability; drain voltage; drift transport; gate overdrive; gate voltage; metal-high-k gate stack structure; p-MOSFET; short channel effect; Correlation; Logic gates; MOSFET circuits; MOSFETs; Threshold voltage;
         
        
        
        
            Conference_Titel : 
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
         
        
            Conference_Location : 
Shanghai
         
        
            Print_ISBN : 
978-1-4244-5797-7
         
        
        
            DOI : 
10.1109/ICSICT.2010.5667460