• DocumentCode
    1632143
  • Title

    Influence of carrier transport on drain-current variability of MOSFETs

  • Author

    Ohmori, Kenji ; Shiraishi, Kenji ; Yamada, Keisaku

  • Author_Institution
    Nanotechnol. Lab., Waseda Univ., Tokyo, Japan
  • fYear
    2010
  • Firstpage
    879
  • Lastpage
    882
  • Abstract
    We have investigated static variability of p-MOSFETs by evaluating the drain current under various conditions of gate and drain voltages. The value of drain current variability (σId/Id) is proportional to (LW)-1/2 before the short channel effect appears, being similar to that of Vt variability. The magnitude of σId/Id decreases as the gate overdrive (Vg-Vt) decreases and classified into two regimes that corresponds to the carrier conduction mechanisms, i.e., diffusion and drift transports. This result strongly suggests that the dominant factors for determining σId/Id values are related to the carrier conduction mechanisms.
  • Keywords
    MOSFET; high-k dielectric thin films; carrier conduction mechanism; carrier transport; diffusion transport; drain current variability; drain voltage; drift transport; gate overdrive; gate voltage; metal-high-k gate stack structure; p-MOSFET; short channel effect; Correlation; Logic gates; MOSFET circuits; MOSFETs; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-5797-7
  • Type

    conf

  • DOI
    10.1109/ICSICT.2010.5667460
  • Filename
    5667460