Title :
Effect of rapid thermal annealing on the optical properties of Nb2O5-Al2O3 nanolaminate films
Author :
Huang, Yue ; Xu, Yan ; Lu, Hong-Liang ; Sun, Qing-Qing ; Ding, Shi-Jin ; Wei Zhang
Author_Institution :
State Key Lab. of ASIC & Syst., Fudan Univ., Shanghai, China
Abstract :
Nb2O5-Al2O3 nanolaminate films have been grown by atomic layer deposition using (Nb(OC2H5)5)/H2O, and Al(CH3)3/H2O precursors, respectively. Effect of rapid thermal annealing (RTA) on the optical properties of the nanolaminate has been studied using Fourier transform infrared spectroscopy (FTIR), and spectroscopic ellipsometry. From the FTIR result, Al2O3 suppresses the formation of interfacial layer during RTA. The refractive index of the Nb2O5-Al2O3 films is found to increase after the RTA at 500°C, while decrease with the RTA temperature above 500°C. Moreover, the optical band gap of Nb2O5 film deduced from the extinction coefficient shows a gradual increase with increasing annealing temperature, which is related to a decrease in the film disorder.
Keywords :
Fourier transform spectroscopy; atomic layer deposition; infrared spectroscopy; laminates; nanostructured materials; nanotechnology; optical properties; rapid thermal annealing; (Nb(OC2H5)5)-H2O; Al(CH3)3-H2O; FTIR; Fourier transform infrared spectroscopy; Nb2O5-Al2O3; RTA temperature; atomic layer deposition; extinction coefficient; interfacial layer; nanolaminate film; optical band gap; optical property; rapid thermal annealing; spectroscopic ellipsometry; temperature 500 C; Aluminum oxide; Annealing; Optical films; Optical refraction; Optical variables control; Photonic band gap;
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-5797-7
DOI :
10.1109/ICSICT.2010.5667480
