DocumentCode
1632814
Title
Analysis of software process improvement experience using the project visibility index
Author
Sakamoto, Keishi ; Niihara, Naoki ; Tanaka, Toshifumi ; Nakakoji, Kumiyo ; Kishida, Kouichi
Author_Institution
OMRON Corp., Shiga, Japan
fYear
1996
Firstpage
139
Lastpage
148
Abstract
Based on the capability maturity model (CMM), process improvement at OMRON, a Japanese microprocessor manufacturer, increased project predictability in three ways: accuracy, variability, and performance. The authors use the project visibility index (PVI) and other measurements to quantitatively demonstrate this. Qualitative analysis of how and why OMRON achieved higher project visibility and increases in the QCD (quality, cost, and delivery on time) factors are supported with data on review-effort ratios and productivity. They identify factors directly affected by high project visibility
Keywords
DP industry; economics; electronics industry; human resource management; project management; software cost estimation; software development management; software quality; Japanese microprocessor manufacturer; OMRON; accuracy; capability maturity model; cost; performance; productivity; project predictability; project visibility; project visibility index; qualitative analysis; quality; review-effort ratios; software process improvement; timely delivery; variability; Capability maturity model; Coordinate measuring machines; Costs; Information analysis; Productivity; Programming; Project management; Software development management; Software engineering; Software quality;
fLanguage
English
Publisher
ieee
Conference_Titel
Software Engineering Conference, 1996. Proceedings., 1996 Asia-Pacific
Conference_Location
Seoul
Print_ISBN
0-8186-7638-8
Type
conf
DOI
10.1109/APSEC.1996.566749
Filename
566749
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