DocumentCode :
1632853
Title :
Surface Potentials Near the UV Light/Dark Boundary
Author :
Wang, X. ; Horanyi, M. ; Colwell, J. ; Sternovsky, Z. ; Robertson, S.
Author_Institution :
Colorado Univ., Boulder
fYear :
2007
Firstpage :
919
Lastpage :
919
Abstract :
Summary form only given. Study of surface potentials near the lunar terminator is important for understanding dust dynamics in this region. The Lunar Ejecta and Meteorite Experiment deployed during the Apollo 17 mission observed an increased frequency of dust impacts at lunar sunrise and sunset. A laboratory model of the lunar surface is being developed for measuring the surface potential distribution near the UV light/dark boundary and for developing instruments to diagnose the lunar photoelectron layer. In initial experiments, a metal sheet is illuminated by a 1000 W Hg-Xe UV source. An adjacent metal surface is cut into stripes insulated from each other. A shadow of the UV light is made by a light stopper outside the vacuum chamber. The surface potential of the illuminated metal sheet and surface potentials of the metal stripes are measured by high impedance probes. Surface potentials are comparable in magnitude to the difference between the work function (~4.1 eV) and the most energetic photons (~6 eV). Experiments will continue with materials of different work function and with simulated lunar regolith.
Keywords :
cosmic dust; lunar surface; UV light/dark boundary; dust dynamics; dust impacts; lunar photoelectron layer; lunar regolith; lunar sunrise; lunar sunset; lunar surface; lunar terminator; surface potential distribution; Frequency; Impedance measurement; Instruments; Insulation; Laboratories; Moon; Probes; Sheet materials; Surface impedance; Ultraviolet sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2007. ICOPS 2007. IEEE 34th International Conference on
Conference_Location :
Albuquerque, NM
ISSN :
0730-9244
Print_ISBN :
978-1-4244-0915-0
Type :
conf
DOI :
10.1109/PPPS.2007.4346225
Filename :
4346225
Link To Document :
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