DocumentCode
1633441
Title
Next generation lithography: Impact on device and circuit architecture and performance
Author
Sivakumar, Sam
Author_Institution
Portland Technol. Dev., Intel Corp., Hillsboro, OR, USA
fYear
2010
Firstpage
999
Lastpage
999
Abstract
Lithographic scaling has been the driver for Moore Law over multiple process generations. Through the use of more advanced imaging technology and the development of advanced photoresists that are capable of finer resolution, the microelectronics industry has sustained a remarkable trend in the increase of complexity, capability and scale that is unparalleled in human endeavor.
Keywords
electronics industry; photoresists; Moore law; advanced photoresists; circuit architecture; lithographic scaling; microelectronics industry; next generation lithography; Imaging; Lenses; Lighting; Lithography; Performance evaluation; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location
Shanghai
Print_ISBN
978-1-4244-5797-7
Type
conf
DOI
10.1109/ICSICT.2010.5667515
Filename
5667515
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