Title :
Next generation lithography: Impact on device and circuit architecture and performance
Author_Institution :
Portland Technol. Dev., Intel Corp., Hillsboro, OR, USA
Abstract :
Lithographic scaling has been the driver for Moore Law over multiple process generations. Through the use of more advanced imaging technology and the development of advanced photoresists that are capable of finer resolution, the microelectronics industry has sustained a remarkable trend in the increase of complexity, capability and scale that is unparalleled in human endeavor.
Keywords :
electronics industry; photoresists; Moore law; advanced photoresists; circuit architecture; lithographic scaling; microelectronics industry; next generation lithography; Imaging; Lenses; Lighting; Lithography; Performance evaluation; Ultraviolet sources;
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-5797-7
DOI :
10.1109/ICSICT.2010.5667515
