Optical Observation of Gas Jet Z-pinch Discharge Produced Extreme Ultraviolet Light Source

Summary form only given. A gas jet Z-pinch discharge light source has been developed for realize the EUV lithography. Our original light source has advantages of a smaller size of pinch plasma, a larger collection solid angle and possibility of low debris emission. It is well-known that the debris generation is an inherent problem of the discharge produced plasma light source. Therefore it is expected that our gas jet Z pinch electrode will overcome the debris problem. In previous study, it is observed that the He gas curtain has an additional function of limiting the expansion of Xe gas and increasing the emission intensity. However, it is also observed that the interaction between discharge gas (Xe) and curtain gas (He) causes the attenuation of EUV emission. In present study, for the purpose of optimizing the gas flow around the discharge electrodes, the discharge and curtain gas flow have been visualized by using the planar laser-induced fluorescence method. Details and preliminary experimental results will be presented.