Title :
Rejection Strategies with Multiple Classifiers for Handwritten Character Recognition
Author :
Yin, Xu-Cheng ; Hao, Hong-Wei ; Tang, Yun-Feng ; Sun, Jun ; Naoi, Satoshi
Author_Institution :
Dept. of Comput. Sci., Univ. of Sci. & Technol., Beijing, China
Abstract :
With rejection strategies in a handwriting recognition system, we are able to improve the reliability and accuracy of the recognized characters. In this paper, we propose several rejection strategies with multiple classifiers for handwritten character recognition. First, the rejection strategy for the single classifier is introduced, which is composed of three stages: initial scaling, confidence measure calculation, and rejection performing. Then, we analyze rejection strategies for multiple classifiers. We divided our rejection strategies into two categories: (1) for voting combination; and (2) for linear combination with multiple classifiers. In the voting combination style, three rejection strategies, OR, AND, and VOTING, are proposed. And for the linear combination one, rejection strategies for average and weighted combination are analyzed respectively. We also experiment and compare our rejection strategies with handwritten digit recognition.
Keywords :
handwriting recognition; handwritten character recognition; pattern classification; confidence measure calculation; handwriting recognition system; handwritten character recognition; handwritten digit recognition; initial scaling; linear combination; multiple classifier; rejection performing; rejection strategy; voting combination; Character recognition; Computer science; Handwriting recognition; Information analysis; Performance evaluation; Reliability engineering; Research and development; Sun; Text analysis; Voting; handwritten character recognition; multiple classifiers; rejection strategies;
Conference_Titel :
Document Analysis and Recognition, 2009. ICDAR '09. 10th International Conference on
Conference_Location :
Barcelona
Print_ISBN :
978-1-4244-4500-4
Electronic_ISBN :
1520-5363
DOI :
10.1109/ICDAR.2009.45