Title :
Mechanisms of nanochannel formation processes: Thermal oxidation of Si nanostructures and graphene formation on SiC
Author :
Kageshima, Hiroyuki
Author_Institution :
NTT Basic Res. Labs., Nippon Telegraph & Telephone Corp., Atsugi, Japan
Abstract :
Two topics are introduced from our studies on the formation mechanisms of nanochannels: thermal silicon oxidation to form silicon wire channels, and silicon-carbide thermal decomposition to form atomically thin graphene channels. Silicon emission and oxide viscous flow processes are necessary to explain thermal oxidation to form silicon nanochannels. Interfacial growth should be considered for the epitaxial graphene formation on silicon-carbide substrate.
Keywords :
epitaxial growth; graphene; microchannel flow; nanostructured materials; oxidation; silicon compounds; wide band gap semiconductors; SiC; epitaxial graphene formation; nanochannel formation processes; nanostructures; silicon carbide substrate; thermal oxidation; Epitaxial growth; Oxidation; Silicon; Silicon carbide; Strain; Substrates; Surface morphology;
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-5797-7
DOI :
10.1109/ICSICT.2010.5667608