DocumentCode
1635920
Title
Studies of the effects of the bore length during plasma immersion ion implantation of a small cylindrical bore with auxiliary electrode by two-dimensional fluid model
Author
Kwok, T.K. ; Zeng, X.C. ; Chu, Paul K.
Author_Institution
Dept. of Phys. & Mater. Sci., City Polytech. of Hong Kong, Kowloon, Hong Kong
fYear
1998
Firstpage
217
Abstract
Summary form only given. The inner surface modification of many industrial components, such as dies, bushings, pipes, etc, using plasma immersion ion implantation (PIII) has grabbed the attention of physicists and materials scientists. One drawback of the PIII modification of inner surface is low ion impact energy. It has been shown that by inserting a zero potential conductive auxiliary electrode positioned at the axis of the implanted cylindrical bore, the average ion impact energy can be raised. Plasma immersion ion implantation (PIII) of the inner surface of a finite-length small cylindrical bore with a coaxial, grounded auxiliary electrode are calculated using a two-dimensional fluid model. Various ratios of bore diameters against bore lengths are simulated. It is found that the sheath structure resulting from the auxiliary electrode focuses ions from both inside and outside the bore onto the inner surface. If the bore length is long enough, the ions from outside the bore cannot be implanted into the deeper region of the inner surface. Therefore, we can simulate the implantation of the deeper region by a one-dimensional fluid model.
Keywords
digital simulation; ion implantation; plasma density; plasma deposition; auxiliary electrode; bore diameters; bore length; bushings; coaxial grounded auxiliary electrode; deeper region implantation simulation; dies; finite-length small cylindrical bore; implanted cylindrical bore; inner surface modification; ion impact energy; one-dimensional fluid model; pipes; plasma immersion ion implantation; plasma sheath structure; small cylindrical bore; two-dimensional fluid model; Boring; Coaxial components; Conducting materials; Electrodes; Insulators; Ion implantation; Materials science and technology; Physics; Plasma immersion ion implantation; Plasma simulation;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location
Raleigh, NC, USA
ISSN
0730-9244
Print_ISBN
0-7803-4792-7
Type
conf
DOI
10.1109/PLASMA.1998.677723
Filename
677723
Link To Document