DocumentCode
1636158
Title
Floating dynamic access technology
Author
Zehong Li ; Guo, Liangquan ; Zhai, Xiangkun ; Zhang, B. ; Li, Z.J. ; Su, Wei
Author_Institution
Coll. of Microelectron. & Solid-State-Electron., Univ. of Electron. Sci. & Technol. of China, Chengdu, China
Volume
2
fYear
2004
Firstpage
1511
Abstract
A dual gate cell with double injection one-transistor dynamic access structure is proposed. Based on the change of potential, using the floating effect, the cell works on high injection efficiency and low read-out time. The character of the dual gate cell with double injection is found to be better than the single injection cell using a two-dimensional simulator. The development history of the dynamic access cell based on a MOS structure is introduced; this is considered to decrease the chip area and to improve the integration level. The DRAM cell structure changes from the original four-transistor structure to a three-transistor structure, and to the mature product structure - one transistor and one capacitor (1T/1C). So far, the study has focused on the one-transistor structure.
Keywords
DRAM chips; MOS memory circuits; silicon-on-insulator; DRAM cell structure; MOS structure; SOI-MOS; chip area; double injection; dual gate cell; floating dynamic access technology; injection efficiency; integration level; one-transistor structure; read-out time; Analytical models; CMOS technology; Educational institutions; Electrodes; Fellows; History; MOS capacitors; Microelectronics; Random access memory; Solid state circuits;
fLanguage
English
Publisher
ieee
Conference_Titel
Communications, Circuits and Systems, 2004. ICCCAS 2004. 2004 International Conference on
Print_ISBN
0-7803-8647-7
Type
conf
DOI
10.1109/ICCCAS.2004.1346461
Filename
1346461
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