DocumentCode :
1636158
Title :
Floating dynamic access technology
Author :
Zehong Li ; Guo, Liangquan ; Zhai, Xiangkun ; Zhang, B. ; Li, Z.J. ; Su, Wei
Author_Institution :
Coll. of Microelectron. & Solid-State-Electron., Univ. of Electron. Sci. & Technol. of China, Chengdu, China
Volume :
2
fYear :
2004
Firstpage :
1511
Abstract :
A dual gate cell with double injection one-transistor dynamic access structure is proposed. Based on the change of potential, using the floating effect, the cell works on high injection efficiency and low read-out time. The character of the dual gate cell with double injection is found to be better than the single injection cell using a two-dimensional simulator. The development history of the dynamic access cell based on a MOS structure is introduced; this is considered to decrease the chip area and to improve the integration level. The DRAM cell structure changes from the original four-transistor structure to a three-transistor structure, and to the mature product structure - one transistor and one capacitor (1T/1C). So far, the study has focused on the one-transistor structure.
Keywords :
DRAM chips; MOS memory circuits; silicon-on-insulator; DRAM cell structure; MOS structure; SOI-MOS; chip area; double injection; dual gate cell; floating dynamic access technology; injection efficiency; integration level; one-transistor structure; read-out time; Analytical models; CMOS technology; Educational institutions; Electrodes; Fellows; History; MOS capacitors; Microelectronics; Random access memory; Solid state circuits;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Communications, Circuits and Systems, 2004. ICCCAS 2004. 2004 International Conference on
Print_ISBN :
0-7803-8647-7
Type :
conf
DOI :
10.1109/ICCCAS.2004.1346461
Filename :
1346461
Link To Document :
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