• DocumentCode
    1636158
  • Title

    Floating dynamic access technology

  • Author

    Zehong Li ; Guo, Liangquan ; Zhai, Xiangkun ; Zhang, B. ; Li, Z.J. ; Su, Wei

  • Author_Institution
    Coll. of Microelectron. & Solid-State-Electron., Univ. of Electron. Sci. & Technol. of China, Chengdu, China
  • Volume
    2
  • fYear
    2004
  • Firstpage
    1511
  • Abstract
    A dual gate cell with double injection one-transistor dynamic access structure is proposed. Based on the change of potential, using the floating effect, the cell works on high injection efficiency and low read-out time. The character of the dual gate cell with double injection is found to be better than the single injection cell using a two-dimensional simulator. The development history of the dynamic access cell based on a MOS structure is introduced; this is considered to decrease the chip area and to improve the integration level. The DRAM cell structure changes from the original four-transistor structure to a three-transistor structure, and to the mature product structure - one transistor and one capacitor (1T/1C). So far, the study has focused on the one-transistor structure.
  • Keywords
    DRAM chips; MOS memory circuits; silicon-on-insulator; DRAM cell structure; MOS structure; SOI-MOS; chip area; double injection; dual gate cell; floating dynamic access technology; injection efficiency; integration level; one-transistor structure; read-out time; Analytical models; CMOS technology; Educational institutions; Electrodes; Fellows; History; MOS capacitors; Microelectronics; Random access memory; Solid state circuits;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Communications, Circuits and Systems, 2004. ICCCAS 2004. 2004 International Conference on
  • Print_ISBN
    0-7803-8647-7
  • Type

    conf

  • DOI
    10.1109/ICCCAS.2004.1346461
  • Filename
    1346461