• DocumentCode
    163679
  • Title

    GaN technology for power RF applications: Present reliability roadblocks and future trends

  • Author

    Igic, P. ; Faramehr, S. ; Kalna, Karol

  • Author_Institution
    Electron. Syst. Design Centre, Swansea Univ., Swansea, UK
  • fYear
    2014
  • fDate
    12-14 May 2014
  • Firstpage
    77
  • Lastpage
    80
  • Abstract
    The current collapse and normally-on devices are the main roadblocks to the wider employment of the GaN technology. To explain the current collapse effect, surface and bulk trapping/de-trapping phenomena are modeled using 2D drift-diffusion and hydro-dynamic transport models by transient simulations within Silvaco TCAD. The current collapse next to 75% and 5% was observed due to surface and bulk trapping, respectively. The combined surface and bulk trapping is studied using a gate-lag technique showing a good qualitative agreement with experimental observations.
  • Keywords
    III-V semiconductors; gallium compounds; high electron mobility transistors; hydrodynamics; semiconductor device models; semiconductor device reliability; wide band gap semiconductors; 2D drift-diffusion; GaN; GaN technology; Silvaco TCAD; bulk trapping-de-trapping phenomena; current collapse effect; gate-lag technique; hydrodynamic transport models; normally-on devices; power RF applications; reliability roadblocks; surface trapping-de-trapping phenomena; transient simulations; Aluminum gallium nitride; Charge carrier processes; Gallium nitride; HEMTs; High definition video; Logic gates; MODFETs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics Proceedings - MIEL 2014, 2014 29th International Conference on
  • Conference_Location
    Belgrade
  • Print_ISBN
    978-1-4799-5295-3
  • Type

    conf

  • DOI
    10.1109/MIEL.2014.6842089
  • Filename
    6842089