Title :
Silicon micromachining for terahertz component development
Author :
Chattopadhyay, Goutam ; Reck, Theodore J. ; Jung-Kubiak, Cecile ; Siles, Jose V. ; Choonsup Lee ; Lin, Richard ; Mehdi, Imran
Author_Institution :
NASA-Jet Propulsion Lab., California Inst. of Technol., Pasadena, CA, USA
Abstract :
Waveguide component technology at terahertz frequencies has come of age in recent years. Essential components such as ortho-mode transducers (OMT), quadrature hybrids, filters, and others for high performance system development were either impossible to build or too difficult to fabricate with traditional machining techniques. With micromachining of silicon wafers coated with sputtered gold it is now possible to fabricate and test these waveguide components. Using a highly optimized Deep Reactive Ion Etching (DRIE) process, we are now able to fabricate silicon micromachined waveguide structures working beyond 1 THz. In this paper, we describe in detail our approach of design, fabrication, and measurement of silicon micromachined waveguide components and report the results of a 1 THz canonical E-plane filter.
Keywords :
elemental semiconductors; gold; micromachining; silicon; sputter etching; waveguide filters; Au; DRIE process; Si; canonical E-plane filter; frequency 1 THz; highly optimized deep reactive ion etching process; ortho-mode transducers; quadrature hybrids; silicon micromachined waveguide components; silicon micromachined waveguide structures; silicon micromachining; silicon wafers; sputtered gold; terahertz component development; terahertz frequencies; waveguide component technology; Etching; Fabrication; Metals; Micromachining; Receivers; Silicon; Waveguide components; DRIE; Filter; micromachine; silicon; terahertz;
Conference_Titel :
Microwave and RF Conference, 2013 IEEE MTT-S International
Conference_Location :
New Delhi
DOI :
10.1109/IMaRC.2013.6777696