• DocumentCode
    1637269
  • Title

    Impact of electron rebound from drain on drive current in nano-scale InGaAs MOSFETs

  • Author

    Fujishiro, Hiroki I. ; Watanabe, Hisanao ; Homma, Takahiro ; Hara, Shinsuke

  • Author_Institution
    Dept. of Appl. Electron., Tokyo Univ. of Sci., Chiba, Japan
  • fYear
    2010
  • Firstpage
    1350
  • Lastpage
    1352
  • Abstract
    We theoretically investigate the mechanism of the electron rebound from the drain into the channel and its impact on the drain current in the nano-scale InGaAs MOSFETs by using the quantum corrected Monte Carlo (MC) simulation. The electrons almost ballistically transport in the channel at the gate length, Lg, of 10 nm. However the electron rebound becomes pronounced instead when the electrons degenerate at the bottleneck. Consequently the average electron velocity at the bottleneck, vs, decreases. This considerably diminishes the potential of the InGaAs MOSFETs for the current drivability.
  • Keywords
    MOSFET; Monte Carlo methods; gallium arsenide; indium compounds; InGaAs; average electron velocity; drain current; drive current; electron rebound; quantum corrected Monte Carlo simulation; size 10 nm; Electric potential; Indium gallium arsenide; Logic gates; MOSFETs; Optical scattering; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-5797-7
  • Type

    conf

  • DOI
    10.1109/ICSICT.2010.5667657
  • Filename
    5667657