DocumentCode
1637269
Title
Impact of electron rebound from drain on drive current in nano-scale InGaAs MOSFETs
Author
Fujishiro, Hiroki I. ; Watanabe, Hisanao ; Homma, Takahiro ; Hara, Shinsuke
Author_Institution
Dept. of Appl. Electron., Tokyo Univ. of Sci., Chiba, Japan
fYear
2010
Firstpage
1350
Lastpage
1352
Abstract
We theoretically investigate the mechanism of the electron rebound from the drain into the channel and its impact on the drain current in the nano-scale InGaAs MOSFETs by using the quantum corrected Monte Carlo (MC) simulation. The electrons almost ballistically transport in the channel at the gate length, Lg, of 10 nm. However the electron rebound becomes pronounced instead when the electrons degenerate at the bottleneck. Consequently the average electron velocity at the bottleneck, vs, decreases. This considerably diminishes the potential of the InGaAs MOSFETs for the current drivability.
Keywords
MOSFET; Monte Carlo methods; gallium arsenide; indium compounds; InGaAs; average electron velocity; drain current; drive current; electron rebound; quantum corrected Monte Carlo simulation; size 10 nm; Electric potential; Indium gallium arsenide; Logic gates; MOSFETs; Optical scattering; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location
Shanghai
Print_ISBN
978-1-4244-5797-7
Type
conf
DOI
10.1109/ICSICT.2010.5667657
Filename
5667657
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