DocumentCode :
1637269
Title :
Impact of electron rebound from drain on drive current in nano-scale InGaAs MOSFETs
Author :
Fujishiro, Hiroki I. ; Watanabe, Hisanao ; Homma, Takahiro ; Hara, Shinsuke
Author_Institution :
Dept. of Appl. Electron., Tokyo Univ. of Sci., Chiba, Japan
fYear :
2010
Firstpage :
1350
Lastpage :
1352
Abstract :
We theoretically investigate the mechanism of the electron rebound from the drain into the channel and its impact on the drain current in the nano-scale InGaAs MOSFETs by using the quantum corrected Monte Carlo (MC) simulation. The electrons almost ballistically transport in the channel at the gate length, Lg, of 10 nm. However the electron rebound becomes pronounced instead when the electrons degenerate at the bottleneck. Consequently the average electron velocity at the bottleneck, vs, decreases. This considerably diminishes the potential of the InGaAs MOSFETs for the current drivability.
Keywords :
MOSFET; Monte Carlo methods; gallium arsenide; indium compounds; InGaAs; average electron velocity; drain current; drive current; electron rebound; quantum corrected Monte Carlo simulation; size 10 nm; Electric potential; Indium gallium arsenide; Logic gates; MOSFETs; Optical scattering; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-5797-7
Type :
conf
DOI :
10.1109/ICSICT.2010.5667657
Filename :
5667657
Link To Document :
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