• DocumentCode
    1638037
  • Title

    Impact of the two traps related leakage mechanism on the tail distribution of DRAM retention characteristics

  • Author

    Ueno, S. ; Inoue, Y. ; Inuishi, M.

  • Author_Institution
    ULSI Dev. Center, Mitsubishi Electr. Corp., Hyogo, Japan
  • fYear
    1999
  • Firstpage
    37
  • Lastpage
    40
  • Abstract
    Two traps related leakage mechanism is proposed to explain the tail distribution of the DRAM retention characteristics. The main mode is explained by the trap assisted tunneling with one trap. We propose that the tail mode is created when the two traps are close enough to cooperate for increasing the leakage current. We calculate both the main and the tail distributions with the Monte Carlo method by using one basic equation deduced from our model for the first time.
  • Keywords
    DRAM chips; Monte Carlo methods; electron traps; leakage currents; tunnelling; DRAM; Monte Carlo model; leakage current; retention characteristics; tail distribution; trap assisted tunneling; Area measurement; Current measurement; Equations; Leakage current; Probability distribution; Random access memory; System testing; Tail; Tunneling; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1999. IEDM '99. Technical Digest. International
  • Conference_Location
    Washington, DC, USA
  • Print_ISBN
    0-7803-5410-9
  • Type

    conf

  • DOI
    10.1109/IEDM.1999.823841
  • Filename
    823841