DocumentCode
1638037
Title
Impact of the two traps related leakage mechanism on the tail distribution of DRAM retention characteristics
Author
Ueno, S. ; Inoue, Y. ; Inuishi, M.
Author_Institution
ULSI Dev. Center, Mitsubishi Electr. Corp., Hyogo, Japan
fYear
1999
Firstpage
37
Lastpage
40
Abstract
Two traps related leakage mechanism is proposed to explain the tail distribution of the DRAM retention characteristics. The main mode is explained by the trap assisted tunneling with one trap. We propose that the tail mode is created when the two traps are close enough to cooperate for increasing the leakage current. We calculate both the main and the tail distributions with the Monte Carlo method by using one basic equation deduced from our model for the first time.
Keywords
DRAM chips; Monte Carlo methods; electron traps; leakage currents; tunnelling; DRAM; Monte Carlo model; leakage current; retention characteristics; tail distribution; trap assisted tunneling; Area measurement; Current measurement; Equations; Leakage current; Probability distribution; Random access memory; System testing; Tail; Tunneling; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1999. IEDM '99. Technical Digest. International
Conference_Location
Washington, DC, USA
Print_ISBN
0-7803-5410-9
Type
conf
DOI
10.1109/IEDM.1999.823841
Filename
823841
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