• DocumentCode
    1638148
  • Title

    Low leakage bulk silicon substrate based SDOI FINFETs

  • Author

    Liu, Jia ; Luo, Zhijiong ; Yin, Haizhou ; Zhu, Huilong ; Wang, Hefei ; Yuan, Feng

  • Author_Institution
    Inst. of Microelectron., Chinese Acad. of Sci., Beijing, China
  • fYear
    2010
  • Firstpage
    1820
  • Lastpage
    1822
  • Abstract
    This work presents a novel low leakage bulk substrate based SDOI (Source-Drain on Insulator) FINFET structure and a new integration scheme for fabrication thereof. Through simulation, SDOI FINFETs were thoroughly compared to Bulk FINFETs and SOI FINFETs. SDOI FINFETs clearly achieved SOI FINFETs like excellent subthreshold characteristics, low leakage current and low capacitance, while maintained high thermal conduction. By combining the benefits from the SOI FINFET and the Bulk FINFET, the SDOI FINFET shows a great potential to replace the planar MOSFET and to further extend Moore´s law.
  • Keywords
    MOSFET; heat conduction; leakage currents; silicon-on-insulator; FINFET structure; Moore´s law; SDOI FINFET; SOI FINFET; bulk FINFET; low capacitance; low leakage bulk silicon substrate; low leakage bulk substrate; low leakage current; planar MOSFET; source-drain on insulator; subthreshold characteristics; thermal conduction; Capacitance; Doping; FinFETs; Implants; Leakage current; Logic gates; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-5797-7
  • Type

    conf

  • DOI
    10.1109/ICSICT.2010.5667687
  • Filename
    5667687