DocumentCode
1638148
Title
Low leakage bulk silicon substrate based SDOI FINFETs
Author
Liu, Jia ; Luo, Zhijiong ; Yin, Haizhou ; Zhu, Huilong ; Wang, Hefei ; Yuan, Feng
Author_Institution
Inst. of Microelectron., Chinese Acad. of Sci., Beijing, China
fYear
2010
Firstpage
1820
Lastpage
1822
Abstract
This work presents a novel low leakage bulk substrate based SDOI (Source-Drain on Insulator) FINFET structure and a new integration scheme for fabrication thereof. Through simulation, SDOI FINFETs were thoroughly compared to Bulk FINFETs and SOI FINFETs. SDOI FINFETs clearly achieved SOI FINFETs like excellent subthreshold characteristics, low leakage current and low capacitance, while maintained high thermal conduction. By combining the benefits from the SOI FINFET and the Bulk FINFET, the SDOI FINFET shows a great potential to replace the planar MOSFET and to further extend Moore´s law.
Keywords
MOSFET; heat conduction; leakage currents; silicon-on-insulator; FINFET structure; Moore´s law; SDOI FINFET; SOI FINFET; bulk FINFET; low capacitance; low leakage bulk silicon substrate; low leakage bulk substrate; low leakage current; planar MOSFET; source-drain on insulator; subthreshold characteristics; thermal conduction; Capacitance; Doping; FinFETs; Implants; Leakage current; Logic gates; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location
Shanghai
Print_ISBN
978-1-4244-5797-7
Type
conf
DOI
10.1109/ICSICT.2010.5667687
Filename
5667687
Link To Document