• DocumentCode
    1639197
  • Title

    A comparative device and performance analysis between a Si-Ge epitaxial-base HBT and a Si double-poly I/I BJT npn structure

  • Author

    Pelella, Mario M. ; Nguyen, Phung T. ; Saccamango, Mary Jo ; Ratanaphanyarat, Somnuk ; Comfort, James H. ; Fischer, Stephen E. ; Knepper, Ronald W. ; Peressini, Peter P. ; Chu, Sanford F.

  • Author_Institution
    Semiconductor R&D Center, IBM, East Fishkill, NY, USA
  • fYear
    1992
  • Firstpage
    46
  • Lastpage
    49
  • Abstract
    The device characteristics and performance leverage of a SiGe epitaxial-base heterojunction bipolar transistor (HBT) are compared to those of an advanced Si double-poly ion-implanted (I/I)-base bipolar junction transistor (BJT) npn structure. In addition, a collector-base profile optimization for the SiGe device structure is described. Two-dimensional numerical process and device simulators and a lumped equivalent circuit model generator are used for the comparison along with experimental data. The simulated results show a greater than 3× increase in current gain, a 1.5× increase in the unity-gain cutoff frequency, and a 13% improvement in ECL circuit delay for the SiGe device. The experimental results confirm the device behavior predicted by the simulations
  • Keywords
    Ge-Si alloys; bipolar transistors; elemental semiconductors; heterojunction bipolar transistors; semiconductor device models; semiconductor materials; silicon; 2D numerical process simulation; BJT npn structure; ECL circuit delay; Si double poly ion-implanted structure; Si-Ge epitaxial-base HBT; SiGe-Si; collector-base profile optimization; current gain; device characteristics; device simulators; heterojunction bipolar transistor; lumped equivalent circuit model generator; performance analysis; unity-gain cutoff frequency; Circuit simulation; Cutoff frequency; Delay; Equivalent circuits; Germanium silicon alloys; Heterojunction bipolar transistors; Performance analysis; Predictive models; Semiconductor process modeling; Silicon germanium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bipolar/BiCMOS Circuits and Technology Meeting, 1992., Proceedings of the 1992
  • Conference_Location
    Minneapolis, MN
  • Print_ISBN
    0-7803-0727-5
  • Type

    conf

  • DOI
    10.1109/BIPOL.1992.274085
  • Filename
    274085