DocumentCode
1639651
Title
Bandstructures of unstrained and strained silicon nanowire
Author
Zhang, Lining ; Lou, Haijun ; Liu, Zhiwei ; He, Frank ; Chan, Mansun
fYear
2010
Firstpage
1877
Lastpage
1879
Abstract
Energy bandstructures of unstrained and strained [100] silicon nanowires are calculated with nearest neighbor (NN) sp3d5s* tight binding model. Square nanowires with four {110} bounding facets of various thicknesses are simulated. It is found that bandgaps of nanowires increase with decreasing the wire thickness. Uniaxial strain effects are accounted for by displacing the silicon atoms and modifying the energy parameters in the tight binding model. The results indicate that both compressive and tensile strains reduce the bandgap and tensile strain reduces the hole effective mass at the valence band edge significantly.
Keywords
elemental semiconductors; energy gap; nanowires; semiconductor quantum wires; silicon; tight-binding calculations; valence bands; energy bandstructure; silicon atom; square nanowire; tensile strain; tight binding model; uniaxial strain effect; unstrained silicon nanowire; valence band edge; Atomic layer deposition; Effective mass; Photonic band gap; Silicon; Tensile strain; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location
Shanghai
Print_ISBN
978-1-4244-5797-7
Type
conf
DOI
10.1109/ICSICT.2010.5667741
Filename
5667741
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