• DocumentCode
    1641484
  • Title

    A high repetitive, laboratory scale EUV source based on a gas discharge plasma

  • Author

    Bergmann, Karel ; Schriever, G. ; Neff, W. ; Lebert, R.

  • Author_Institution
    Fraunhofer-Inst. fur Lasertechnik, Aachen, Germany
  • fYear
    1998
  • Firstpage
    243
  • Abstract
    Summary form only given. In this work a gas discharge plasma is presented, where these problems can be solved. In the device presented a pinch plasma is generated in a fast discharge of about 2J of electrically stored energy leading to a peak current of about 10 kA. Using oxygen, the emission of lithium-like ions at around 13 nm can be observed, which indicates a plasma temperature of about 20 eV. Time resolved measurements show a X-ray pulse of about 10 ns duration occurring at the instant of maximum compression that can be observed in the current pulse (dI/dt). In first experiments a repetitive operation of more than 100 Hz could be demonstrated.
  • Keywords
    discharges (electric); plasma applications; plasma temperature; spectroscopic light sources; 10 kA; 10 ns; 100 Hz; 13 nm; 2 J; 20 eV; Li-like ions; X-ray pulse; current pulse; electrically stored energy; fast discharge; gas discharge plasma; high repetitive laboratory scale EUV source; maximum compression; oxygen emission; peak current; pinch plasma; plasma temperature; pulse duration; repetitive operation; time-resolved measurements; Discharges; Energy resolution; Fault location; Laboratories; Plasma devices; Plasma measurements; Plasma sources; Plasma temperature; Pulse compression methods; Pulse measurements;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
  • Conference_Location
    Raleigh, NC, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-4792-7
  • Type

    conf

  • DOI
    10.1109/PLASMA.1998.677787
  • Filename
    677787