DocumentCode :
1641740
Title :
Long-implosion plasma radiation source
Author :
Riordan, James ; Apruzese, J. ; Chochran, F. ; Coleman, Philip ; Commisso, R. ; Coverdale, C. ; Davis, J. ; Deeney, C. ; Failor, B. ; Fisher, Amnon ; Jobe, D. ; LePell, D. ; Levine, John ; Kortbawi, D. ; Krishnan, Mohan ; McGurn, J. ; Moosman, B. ; Mosher
Author_Institution :
Primex Phys. Int., San Leandro, CA, USA
fYear :
1998
Firstpage :
244
Abstract :
Summary form only given. Efficient production of soft X-rays (1 to 5 keV) has been achieved in many laboratories using Z-pinch plasma radiation sources (PRS) driven by short pulses of mega-ampere currents. Empirical and theoretical scaling laws for <100-ns implosions show that the optimum X-ray yield increases strongly with current. The objective of the present work is to extend the implosion time for longer current pulses while maintaining high radiation efficiency. The long implosion time PRS approach will reduce the cost and risk of pulsed power generators required for higher X-ray yields, because it reduces the voltage and power required to drive higher currents into the inductive PRS load. The Decade Quad Simulator, for example, should drive >8 MA with a rise time of 300 ns, coupling >400 kJ to kinetic energy in the Z-pinch.
Keywords :
X-ray production; Z pinch; 1 to 5 keV; 400 kJ; 8 MA; Decade Quad Simulator; Z-pinch plasma radiation sources; higher X-ray yields; kinetic energy; long-implosion plasma radiation source; longer current pulses; mega-ampere currents; optimum X-ray yield; radiation efficiency; scaling laws; soft X-rays production; Argon; Corporate acquisitions; Kinetic energy; Laboratories; Phased arrays; Plasma accelerators; Plasma sources; Weapons; Wire; X-rays;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location :
Raleigh, NC, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-4792-7
Type :
conf
DOI :
10.1109/PLASMA.1998.677788
Filename :
677788
Link To Document :
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