• DocumentCode
    1642736
  • Title

    Cathodic arc deposition of barium oxide for oxide-coated cathodes

  • Author

    Umstattd, R. ; Pi, T. ; Luhmann, N. ; Scheitrum, Glenn ; Monteiro, O. ; Brown, Leslie

  • Author_Institution
    California Univ., Davis, CA, USA
  • fYear
    1998
  • Firstpage
    248
  • Lastpage
    249
  • Abstract
    Summary form only given. Cathodic arc deposition is used to create a barium oxide plasma which is then deposited/implanted onto a cathode nickel substrate. The primary motivation for this work is the critical need for a reliable, repeatable thermionic cathode for the production of high power, microsecond duration microwave pulses.
  • Keywords
    barium compounds; cathodes; plasma deposited coatings; plasma deposition; BaO; Ni; cathode Ni substrate; cathodic arc deposition; high power microsecond duration microwave pulses; implantation; oxide-coated cathodes; thermionic cathode; Argon; Barium; Cathodes; Fault location; Ion sources; Nickel; Plasma density; Plasma sources; Plasma temperature; Production;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
  • Conference_Location
    Raleigh, NC, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-4792-7
  • Type

    conf

  • DOI
    10.1109/PLASMA.1998.677800
  • Filename
    677800