Title :
A holistic methodology to address leading edge FPGA manufacturing challenge
Author :
Chen, Cinti ; Zhao, Joe W. ; Chang, Ellis ; Li, Xiao-Yu
Author_Institution :
Xilinx, Inc., San Jose, CA, USA
Abstract :
A yield ramp methodology for Field-Programmable Gate Array (FPGA) in advanced technologies has been presented. By optimizing design based defect inspection setups, we can use defect-to-bit overlay mapping method more effectively and more reliably in product failure debug. This is complimentary to the manufacturing fab´s test vehicles, electrical tests and physical failure analysis for faster wafer failure root cause analysis. With integrating the critical area analysis and defect criticality calculation, this proven methodology provides fab-less and fab-lit companies more tools in their efforts of design for yield, design for manufacturing and design for tests.
Keywords :
design for manufacture; design for testability; failure analysis; field programmable gate arrays; inspection; FPGA manufacturing challenge; critical area analysis; defect criticality calculation; defect-to-bit overlay mapping method; design based defect inspection setups; design for manufacturing; design for tests; electrical tests; fab test vehicles; fab-less companies; fab-lit companies; field-programmable gate array; physical failure analysis; product failure debug; wafer failure root cause analysis; yield ramp methodology; Field programmable gate arrays; Inspection; Layout; Manufacturing; Metals; Monitoring; Reliability;
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-5797-7
DOI :
10.1109/ICSICT.2010.5667863