• DocumentCode
    1643243
  • Title

    Threshold voltage increase by quantum mechanical narrow channel effect in ultra-narrow MOSFETs

  • Author

    Majima, H. ; Ishikuro, H. ; Hiramoto, T.

  • Author_Institution
    Inst. of Ind. Sci., Tokyo Univ., Japan
  • fYear
    1999
  • Firstpage
    379
  • Lastpage
    382
  • Abstract
    This paper describes a new narrow channel effect by quantum mechanical effects in ultra-narrow MOSFETs. Threshold voltage increase is observed at room temperature in ultra-narrow MOSFETs whose channel width is less than 10 nm. This result is in excellent agreement with simulation that takes into account horizontal and vertical carrier confinement in a silicon narrow wire, indicating that the increase in threshold voltage is caused by the quantum mechanical narrow channel effect.
  • Keywords
    MOSFET; 10 nm; Si; carrier confinement; numerical simulation; quantum mechanical narrow channel effect; silicon wire; threshold voltage; ultra-narrow MOSFET; Carrier confinement; Electron beams; Fabrication; Lithography; MOSFETs; Quantum mechanics; Resists; Substrates; Temperature; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1999. IEDM '99. Technical Digest. International
  • Conference_Location
    Washington, DC, USA
  • Print_ISBN
    0-7803-5410-9
  • Type

    conf

  • DOI
    10.1109/IEDM.1999.824174
  • Filename
    824174