DocumentCode :
1643470
Title :
CBRN Decontamination using a Large-Area Cold Plasma Applicator
Author :
Konesky, Gregory
Author_Institution :
K-Plasma Ltd., Hampton Bays, NY
fYear :
2008
Firstpage :
530
Lastpage :
534
Abstract :
The medical community has used cold plasma for several years. A cold plasma is an ionized gas in which only a small fraction of the gas molecules are ionized, and is formed by passing an inert gas, such as argon or helium, over a sharp conductive point that is held at high voltage and high frequency. An additional benefit in the medical application of this technology is enhanced wound healing due to the destruction of infectious microbial agents without damaging healthy tissue. By expanding the cold plasma applicator to an area of a square meter or more, a general purpose decontamination device results with uses in the destruction of biological and chemical agents, and in assisting in the removal of radiological agents, while causing minimal or no damage to the contaminated substrate material. This approach is especially useful on porous surfaces. The use of large-area low cost applicators, utilizing numerous simultaneous independent plasma emitters for CBRN decontamination applications is considered.
Keywords :
biological effects of ionising radiation; biological tissues; biomedical equipment; diagnostic radiography; microorganisms; plasma applications; CBRN decontamination; chemical, biological or radionuclear decontamination; conductive point; contaminated substrate material; healthy tissue; infectious microbial agents; ionized gas; large-area cold plasma applicator; medical application; plasma emitters; radiological agent removal; Applicators; Argon; Decontamination; Frequency; Helium; Medical services; Plasma applications; Plasma chemistry; Plasma materials processing; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Technologies for Homeland Security, 2008 IEEE Conference on
Conference_Location :
Waltham, MA
Print_ISBN :
978-1-4244-1977-7
Electronic_ISBN :
978-1-4244-1978-4
Type :
conf
DOI :
10.1109/THS.2008.4534509
Filename :
4534509
Link To Document :
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