Title :
Toward scientific manufacturing
Author_Institution :
Device Anal. Technol. Labs., Kawasaki, Japan
Abstract :
This paper first describes two newly developed in-line electrical/physical defect inspection methods, then reviews the technologies we have developed so far which involve in-situ particle monitoring methods in etching/deposition chambers, a logic LSI testing method and computational failure analysis methods for memory/logic LSIs, and finally proposes a concept to achieve scientific manufacturing with these technologies.
Keywords :
failure analysis; inspection; integrated circuit manufacture; integrated circuit testing; large scale integration; process monitoring; computational failure analysis; deposition chamber; etching chamber; in-line defect inspection; in-situ particle monitoring; logic LSI; logic LSI testing; memory LSI; scientific manufacturing; Acceleration; Etching; Failure analysis; Inspection; Large scale integration; Logic testing; Manufacturing; Optical filters; Physics computing; Scanning electron microscopy;
Conference_Titel :
Electron Devices Meeting, 1999. IEDM '99. Technical Digest. International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-5410-9
DOI :
10.1109/IEDM.1999.824195
