DocumentCode :
1643924
Title :
Progress on the development of the CHAMP plasma accelerator
Author :
Bitteker, L.
Author_Institution :
Los Alamos Nat. Lab., NM, USA
fYear :
1998
Firstpage :
254
Abstract :
Summary form only given. The continuous high average-power microsecond pulser (CHAMP) plasma accelerator is being developed at Los Alamos National Laboratory. The CHAMP accelerator uses a ballistically focused, magnetically insulated extraction diode for the plasma source. Four primary systems work in sequence to produce an ion beam namely, the gas puff, the anode induction coil pulse, the magnetic insulation field coil pulse, and the accelerator pulse. Most of the assembly and testing of CHAMP has occurred in the past 12 months. This includes plasma characterization for a static backfill, puff gas fill modeling and experimental characterization, puff fill plasma characterization, and beam extraction. This report details the progress of the assembly and testing as well as describes planned experiments and future upgrades. Most significant of the upgrades is the transition to continuous beam pulse operation.
Keywords :
collective accelerators; plasma diodes; CHAMP plasma accelerator; accelerator pulse; anode induction coil pulse; ballistically focused magnetically insulated extraction diode; beam extraction; continuous beam pulse operation; continuous high average-power microsecond pulser plasma accelerator; experimental characterization; gas puff; ion beam; magnetic insulation field coil pulse; planned experiments; plasma characterization; plasma source; puff fill plasma characterization; puff gas fill modeling; static backfill; Accelerator magnets; Assembly; Coils; Diodes; Insulation; Ion accelerators; Laboratories; Plasma accelerators; Plasma sources; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location :
Raleigh, NC, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-4792-7
Type :
conf
DOI :
10.1109/PLASMA.1998.677814
Filename :
677814
Link To Document :
بازگشت