Title : 
Improved ultraviolet quantum efficiency using a transparent recessed window AlGaN/GaN heterojunction p-i-n photodiode
         
        
            Author : 
Carrarro, J.C. ; Li, T. ; Beck, A.L. ; Collins, C. ; Dupuis, R.D. ; Campbell, J.C. ; Schurman, M.J. ; Ferguson, I.A.
         
        
            Author_Institution : 
Photonics Res. Center, United States Mil. Acad., West Point, NY, USA
         
        
        
        
        
            Abstract : 
High quantum efficiency ultraviolet p-i-n heterojunction photodiodes, fabricated on single crystal AlGaN/GaN, were characterized including spectral responsivity, dark current, and speed. At a reverse bias of -5 V the quantum efficiency was /spl sim/57 % at the band edge, and remained relatively flat down to /spl sim/330 nm after which some absorption in the p-AlGaN layer became evident. We attribute these results to avoidance of the optical dead space at the surface of GaN homojunction p-i-n´s. The transparent p-AlGaN layer was comparatively resistive, causing an electric field crowding effect which resulted in a spatially non-uniform temporal behavior.
         
        
            Keywords : 
III-V semiconductors; aluminium compounds; gallium compounds; p-i-n photodiodes; transparency; ultraviolet detectors; wide band gap semiconductors; -5 V; 280 to 380 nm; 57 percent; AlGaN-GaN; GaN homojunction p-i-n photodiode; UV quantum efficiency; band edge; dark current; electric field crowding effect; high quantum efficiency; optical dead space; p-AlGaN layer absorption; reverse bias; spatially nonuniform temporal behavior; spectral responsivity; speed; transparent p-AlGaN layer; transparent recessed window AlGaN/GaN heterojunction p-i-n photodiode; ultraviolet p-i-n heterojunction photodiodes; Aluminum gallium nitride; Dark current; Electromagnetic wave absorption; Gallium nitride; Heterojunctions; High speed optical techniques; Optical surface waves; PIN photodiodes; Quantum mechanics; Space technology;
         
        
        
        
            Conference_Titel : 
Electron Devices Meeting, 1999. IEDM '99. Technical Digest. International
         
        
            Conference_Location : 
Washington, DC, USA
         
        
            Print_ISBN : 
0-7803-5410-9
         
        
        
            DOI : 
10.1109/IEDM.1999.824222