• DocumentCode
    1645764
  • Title

    Improved 2-D regional transit time analysis for optimized scaling of SiGe HBTs

  • Author

    Moen, Kurt A. ; Yuan, Jiahui ; Chakraborty, Partha S. ; Bellini, Marco ; Cressler, John D. ; Ho, Howard ; Yasuda, Hiroshi ; Wise, Rick

  • Author_Institution
    Sch. of ECE, Georgia Tech, Atlanta, GA, USA
  • fYear
    2010
  • Firstpage
    257
  • Lastpage
    260
  • Abstract
    A new method for two-dimensional (2-D) regional transit time analysis in SiGe HBTs is presented, using a commercially-available TCAD suite with hydrodynamic device simulations. The quasi-static 2-D transit time analysis is first used to determine the cutoff frequency of a well-calibrated 200 GHz SiGe HBT and then applied to the design of hypothetical SiGe HBTs with peak cutoff frequencies of 375 GHz and 450 GHz. These results are benchmarked against full frequency-domain simulations. The new regional analysis is then demonstrated at each scaling node and used to illuminate the 2-D nature of the onset of the Kirk effect and heterojunction barrier effect. These techniques enable the cutoff frequency and transit time components to be determined at lower computational complexity and in greater detail than traditional frequency-domain simulations, and are very useful for optimized scaling.
  • Keywords
    Ge-Si alloys; computational complexity; heterojunction bipolar transistors; hydrodynamics; technology CAD (electronics); 2D regional transit time analysis; HBT; Kirk effect; SiGe; TCAD suite; computational complexity; cutoff frequency; frequency 200 GHz; frequency 375 GHz; frequency 450 GHz; full frequency-domain simulation; heterojunction barrier effect; hydrodynamic device simulation; quasi-static 2D transit time analysis; transit time component; Analytical models; Computational modeling; Current density; Cutoff frequency; Heterojunction bipolar transistors; Silicon germanium; Space charge; SiGe HBT; Transit time analysis; device scaling; regional transit times; silicon-germanium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bipolar/BiCMOS Circuits and Technology Meeting (BCTM), 2010 IEEE
  • Conference_Location
    Austin, TX
  • ISSN
    1088-9299
  • Print_ISBN
    978-1-4244-8578-9
  • Type

    conf

  • DOI
    10.1109/BIPOL.2010.5667973
  • Filename
    5667973