DocumentCode :
1646429
Title :
Theoretical and experimental comparison of optimized doping profiles for high-performance InP Gunn devices at 220-500 GHz
Author :
Kamoua, R. ; Eisele, H.
Author_Institution :
Dept. of Electr. Eng., State Univ. of New York, Stony Brook, NY, USA
Volume :
2
fYear :
2003
Firstpage :
907
Abstract :
Different types of doping profiles are investigated theoretically and experimentally for their potential of improving the performance of InP Gunn devices at J-band (220-325 GHz) frequencies and above. As initial experimental results, devices with an optimized graded doping profile generated output power levels approximately twice the previous state-of-the-art values at 280-300 GHz. Simulations identified a fiat doping profile with a notch at the cathode as even more promising. For example, an RF output power of 50 mW at 240 GHz is predicted for this profile compared to 42 mW at 240 GHz from an optimized graded doping profile.
Keywords :
Gunn devices; III-V semiconductors; doping profiles; indium compounds; 220 to 500 GHz; 42 mW; 50 mW; InP; InP Gunn device; J-band; RF output power; doping profile; Cathodes; Doping profiles; Gallium arsenide; Gunn devices; Heat sinks; Indium phosphide; Oscillators; Power generation; Radio frequency; Semiconductor process modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium Digest, 2003 IEEE MTT-S International
Conference_Location :
Philadelphia, PA, USA
ISSN :
0149-645X
Print_ISBN :
0-7803-7695-1
Type :
conf
DOI :
10.1109/MWSYM.2003.1212516
Filename :
1212516
Link To Document :
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