Title :
Defect tolerant extreme ultraviolet lithography
Author :
Urbanski, Lukasz ; Isoyan, Artak ; Stein, Aaron ; Rocca, Jorge ; Menoni, Carmen ; Marconi, Mario C.
Author_Institution :
Colorado State Univ., Fort Collins, CO, USA
Abstract :
We report on defect tolerant, extreme ultraviolet (EUV) lithography technique. We envision that our technique will impact both the quality and the cost of nano-fabrication with coherent EUV light.
Keywords :
light coherence; masks; nanofabrication; nanolithography; nanophotonics; optical fabrication; ultraviolet lithography; EUV; extreme ultraviolet lithography; mask; nanofabrication; self correcting printing; Atomic force microscopy; Lithography; Resists; Scanning electron microscopy; Tiles; Ultraviolet sources;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2012 Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4673-1839-6
