• DocumentCode
    1646433
  • Title

    Defect tolerant extreme ultraviolet lithography

  • Author

    Urbanski, Lukasz ; Isoyan, Artak ; Stein, Aaron ; Rocca, Jorge ; Menoni, Carmen ; Marconi, Mario C.

  • Author_Institution
    Colorado State Univ., Fort Collins, CO, USA
  • fYear
    2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We report on defect tolerant, extreme ultraviolet (EUV) lithography technique. We envision that our technique will impact both the quality and the cost of nano-fabrication with coherent EUV light.
  • Keywords
    light coherence; masks; nanofabrication; nanolithography; nanophotonics; optical fabrication; ultraviolet lithography; EUV; extreme ultraviolet lithography; mask; nanofabrication; self correcting printing; Atomic force microscopy; Lithography; Resists; Scanning electron microscopy; Tiles; Ultraviolet sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2012 Conference on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-4673-1839-6
  • Type

    conf

  • Filename
    6325392
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1646433