DocumentCode :
1646849
Title :
Custom digital cell generation flow for 65nm processes
Author :
Yeoh, K.L. ; Lim, J.S. ; Goh, K.L. ; Tee, S.M.
Author_Institution :
Circuit Design Autom., Syst.-on-a-Chip Enabling Group, Intel Microelectron., Bayan Lepas, Malaysia
fYear :
2009
Firstpage :
177
Lastpage :
181
Abstract :
Process technologies generate increasing challenges for layout efficiency at the 65nm process. This has increased the reliance on standard cell library development in order to simultaneously meet the demand of today´s tight design schedules. However due to IP-specific design constraints, customized logic cells are frequently necessary to achieve design closure. We explore a design flow that efficiently characterizes a standard cell for power, timing and reliability considerations within custom design, and further synthesizes promising circuit alternatives using a spec-driven optimization approach through transistor level sizing. This methodology provides a unique ability for determining tradeoffs between physical design and circuit design challenges.
Keywords :
circuit optimisation; logic design; IP-specific design constraints; circuit design; custom digital cell generation flow; customized logic cells; design closure; design schedules; layout efficiency; optimization approach; physical design; process technologies; size 65 nm; standard cell library development; transistor level sizing; Aging; Character generation; Circuit simulation; Circuit synthesis; Equations; Logic design; Power generation; Signal design; Software libraries; Timing; cell characterization; custom logic design; performance verification;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SoC Design Conference (ISOCC), 2009 International
Conference_Location :
Busan
Print_ISBN :
978-1-4244-5034-3
Electronic_ISBN :
978-1-4244-5035-0
Type :
conf
DOI :
10.1109/SOCDC.2009.5423903
Filename :
5423903
Link To Document :
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