Title :
Thin film characterization using third harmonic generation microscopy
Author :
Rodríguez, C. ; Weber, R. ; Nguyen, D.N. ; Emmert, L.A. ; Patel, D. ; Menoni, C.S. ; Rudolph, W.
Author_Institution :
Dept. of Phys. & Astron., Univ. of New Mexico, Albuquerque, NM, USA
Abstract :
Third harmonic microscopy is applied to determine nonlinear susceptibilities of thin films and image nascent, laser incubated, and laser damaged dielectric coatings with unprecedented contrast. The relative contribution of signals from the film and its surroundings is analyzed.
Keywords :
coatings; dielectric thin films; hafnium compounds; nonlinear optical susceptibility; optical films; optical harmonic generation; optical microscopy; image nascent coatings; laser damaged dielectric coatings; laser incubated coatings; nonlinear susceptibilities; thin film characterization; third harmonic generation microscopy; Hafnium compounds; Laser beams; Microscopy; Optical imaging; Optical microscopy; Substrates;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2012 Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4673-1839-6
