DocumentCode :
164741
Title :
Electrochemical migration behaviour of surface finishes after vapour phase reflow soldering
Author :
Illes, Balazs ; Medgyes, Balint ; Horvath, Andras
Author_Institution :
Dept. of Electron. Technol., Budapest Univ. of Technol. & Econ., Budapest, Hungary
fYear :
2014
fDate :
23-26 Oct. 2014
Firstpage :
253
Lastpage :
257
Abstract :
This paper presents a comparative study of electrochemical migration behaviour of different surface finishes subjected to vapour phase soldering or infrared reflow process. Three different surface finishes were studied: immersion silver, immersion tin and bare copper on glass fibre epoxy board (FR4) with and without solder mask layer. After the application of the lead-free solder profile on the samples, water drop tests were carried out with distilled water. The developed dendrites were observed by scanning electron microscope in order to study the dendrite morphologies. The electrical characteristics of the short formation on the different samples were also compared. According to the statistical evaluation, it was shown that applied reflow soldering technology could have impact on the electrochemical migration behaviour of the different surface finishes.
Keywords :
copper alloys; dendrites; glass fibres; reflow soldering; scanning electron microscopy; silver alloys; solders; surface finishing; tin alloys; FR4; SnAgCu; bare copper; dendrite morphologies; distilled water; electrical characteristics; electrochemical migration behaviour; glass fibre epoxy board; immersion silver; immersion tin; infrared reflow process; lead-free solder profile; scanning electron microscope; solder mask layer; statistical evaluation; surface finishes; vapour phase reflow soldering; water drop tests; Electric variables; Electronic countermeasures; Metals; Reliability; Surface finishing; Surface morphology; Electrochemical migration; Surface finish; VPS; Vapour phase soldering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design and Technology in Electronic Packaging (SIITME), 2014 IEEE 20th International Symposium for
Conference_Location :
Bucharest
Type :
conf
DOI :
10.1109/SIITME.2014.6967039
Filename :
6967039
Link To Document :
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