• DocumentCode
    1648504
  • Title

    High quality factor and high confinement silicon resonators using etchless process

  • Author

    Griffith, Austin ; Cardenas, Jaime ; Poitras, Carl B. ; Lipson, Michal

  • Author_Institution
    Sch. of Appl. & Eng. Phys., Cornell Univ., Ithaca, NY, USA
  • fYear
    2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We demonstrate high-Q factor and high confinement silicon ring resonators fabricated by a local oxidation of silicon (LOCOS) process. We achieve an intrinsic quality factor of 525,000 in 410 μm-circumference ring resonator.
  • Keywords
    Q-factor; elemental semiconductors; optical fabrication; optical resonators; oxidation; silicon; LOCOS process; Si; etchless process; high confinement silicon resonators; intrinsic quality factor; local oxidation; ring resonator; Couplings; Optical ring resonators; Optical waveguides; Oxidation; Q factor; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2012 Conference on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-4673-1839-6
  • Type

    conf

  • Filename
    6325465
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1648504