DocumentCode :
1649631
Title :
CACTI-3DD: Architecture-level modeling for 3D die-stacked DRAM main memory
Author :
Chen, Ke ; Li, Sheng ; Muralimanohar, Naveen ; Ahn, Jung Ho ; Brockman, Jay B. ; Jouppi, Norman P.
fYear :
2012
Firstpage :
33
Lastpage :
38
Abstract :
Emerging 3D die-stacked DRAM technology is one of the most promising solutions for future memory architectures to satisfy the ever-increasing demands on performance, power, and cost. This paper introduces CACTI-3DD, the first architecture-level integrated power, area, and timing modeling framework for 3D die-stacked off-chip DRAM main memory. CACTI-3DD includes TSV models, improves models for 2D off-chip DRAM main memory over current versions of CACTI, and includes 3D integration models that enable the analysis of a full spectrum of 3D DRAM designs from coarse-grained rank-level 3D stacking to bank-level 3D stacking. CACTI-3DD enables an in-depth study of architecture-level tradeoffs of power, area, and timing for 3D die-stacked DRAM designs. We demonstrate the utility of CACTI-3DD in analyzing design trade-offs of emerging 3D die-stacked DRAM main memories. We find that a coarse-grained 3D DRAM design that stacks canonical DRAM dies can only achieve marginal benefits in power, area, and timing compared to the original 2D design. To fully leverage the huge internal bandwidth of TSVs, DRAM dies must be re-architected, and system implications must be considered when building 3D DRAMs with redesigned 2D planar DRAM dies. Our results show that the 3D DRAM with re-architected DRAM dies achieves significant improvements in power and timing compared to the coarse-grained 3D die-stacked DRAM.
Keywords :
DRAM chips; circuit CAD; integrated circuit design; solid modelling; 3D DRAM designs; 3D die-stacked DRAM main memory; 3D integration models; CACTI-3DD; TSV models; architecture-level modeling; bank-level 3D stacking; canonical DRAM dies; coarse-grained rank-level 3D stacking; future memory architectures; integrated power-area-timing modeling framework; redesigned 2D planar DRAM dies; Capacitance; Integrated circuit modeling; Random access memory; Solid modeling; Three dimensional displays; Through-silicon vias; Timing; 3D architecture; DRAM; Main memory; Modeling; TSV;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design, Automation & Test in Europe Conference & Exhibition (DATE), 2012
Conference_Location :
Dresden
ISSN :
1530-1591
Print_ISBN :
978-1-4577-2145-8
Type :
conf
DOI :
10.1109/DATE.2012.6176428
Filename :
6176428
Link To Document :
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