DocumentCode :
1650629
Title :
Applying yield impact models as a first pass in upgrade decisions [semiconductor manufacturing]
Author :
McIntyre, Michael G. ; Meitz, Jefiey
Author_Institution :
Contamination Free Manuf. Sect., Adv. Micro Devices Inc., Austin, TX, USA
fYear :
1994
Firstpage :
147
Lastpage :
149
Abstract :
As a semiconductor manufacturing leader, AMD fully utilizes all available defect inspection technologies to maintain a comprehensive dynamic yield management program. By obtaining, filtering and finally correlating all defect information AMD has been able to develop yield impact ratios for all commonly identified particles. These impact ratios are then combined to form a yield model used in predicting fab die per wafer (DPW) levels. The focus of this report is on the application of the yield model, and impact ratios used to determine whether it is cost effective to upgrade equipment. Applications illustrating the incorporation of various devices, volumes and technologies are looked at in putting together generic formula guidelines
Keywords :
integrated circuit yield; AMD; dynamic yield management program; fab die per wafer levels; impact ratios; semiconductor manufacturing; upgrade decisions; yield impact models; Costs; Guidelines; Information filtering; Information filters; Inspection; Lead compounds; Predictive models; Semiconductor device manufacture; Semiconductor device modeling; Technology management;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop. 1994 IEEE/SEMI
Conference_Location :
Cambridge, MA
Print_ISBN :
0-7803-2053-0
Type :
conf
DOI :
10.1109/ASMC.1994.588228
Filename :
588228
Link To Document :
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