• DocumentCode
    1650629
  • Title

    Applying yield impact models as a first pass in upgrade decisions [semiconductor manufacturing]

  • Author

    McIntyre, Michael G. ; Meitz, Jefiey

  • Author_Institution
    Contamination Free Manuf. Sect., Adv. Micro Devices Inc., Austin, TX, USA
  • fYear
    1994
  • Firstpage
    147
  • Lastpage
    149
  • Abstract
    As a semiconductor manufacturing leader, AMD fully utilizes all available defect inspection technologies to maintain a comprehensive dynamic yield management program. By obtaining, filtering and finally correlating all defect information AMD has been able to develop yield impact ratios for all commonly identified particles. These impact ratios are then combined to form a yield model used in predicting fab die per wafer (DPW) levels. The focus of this report is on the application of the yield model, and impact ratios used to determine whether it is cost effective to upgrade equipment. Applications illustrating the incorporation of various devices, volumes and technologies are looked at in putting together generic formula guidelines
  • Keywords
    integrated circuit yield; AMD; dynamic yield management program; fab die per wafer levels; impact ratios; semiconductor manufacturing; upgrade decisions; yield impact models; Costs; Guidelines; Information filtering; Information filters; Inspection; Lead compounds; Predictive models; Semiconductor device manufacture; Semiconductor device modeling; Technology management;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop. 1994 IEEE/SEMI
  • Conference_Location
    Cambridge, MA
  • Print_ISBN
    0-7803-2053-0
  • Type

    conf

  • DOI
    10.1109/ASMC.1994.588228
  • Filename
    588228