DocumentCode
1650629
Title
Applying yield impact models as a first pass in upgrade decisions [semiconductor manufacturing]
Author
McIntyre, Michael G. ; Meitz, Jefiey
Author_Institution
Contamination Free Manuf. Sect., Adv. Micro Devices Inc., Austin, TX, USA
fYear
1994
Firstpage
147
Lastpage
149
Abstract
As a semiconductor manufacturing leader, AMD fully utilizes all available defect inspection technologies to maintain a comprehensive dynamic yield management program. By obtaining, filtering and finally correlating all defect information AMD has been able to develop yield impact ratios for all commonly identified particles. These impact ratios are then combined to form a yield model used in predicting fab die per wafer (DPW) levels. The focus of this report is on the application of the yield model, and impact ratios used to determine whether it is cost effective to upgrade equipment. Applications illustrating the incorporation of various devices, volumes and technologies are looked at in putting together generic formula guidelines
Keywords
integrated circuit yield; AMD; dynamic yield management program; fab die per wafer levels; impact ratios; semiconductor manufacturing; upgrade decisions; yield impact models; Costs; Guidelines; Information filtering; Information filters; Inspection; Lead compounds; Predictive models; Semiconductor device manufacture; Semiconductor device modeling; Technology management;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference and Workshop. 1994 IEEE/SEMI
Conference_Location
Cambridge, MA
Print_ISBN
0-7803-2053-0
Type
conf
DOI
10.1109/ASMC.1994.588228
Filename
588228
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