Title :
High-k materials for nonvolatile memory applications
Author_Institution :
IMEC vzw, Leuven, Belgium
Keywords :
dielectric materials; flash memories; random-access storage; semiconductor device reliability; charge trapping devices; engineered barriers; flash memories; high-k materials; interpoly dielectrics; nonvolatile memory devices; reliability issues; tunnel dielectrics; Ferroelectric materials; Flash memory; High K dielectric materials; High-K gate dielectrics; Magnetic materials; Nonvolatile memory; Phase change materials; Random access memory; Reliability engineering; Voltage;
Conference_Titel :
Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. 2005 IEEE International
Print_ISBN :
0-7803-8803-8
DOI :
10.1109/RELPHY.2005.1493090
