• DocumentCode
    1651851
  • Title

    Impact of plasma induced damage on PMOSFETs Tin/HF silicate stack

  • Author

    Song, S.C. ; Bae, S.H. ; Zhang, Z. ; Sim, J.H. ; Sassman, B. ; Bersuker, G. ; Zeitzoff, P. ; Lee, B.H.

  • Author_Institution
    SEMATECH, Austin, TX, USA
  • fYear
    2005
  • Firstpage
    398
  • Lastpage
    402
  • Keywords
    MOSFET; hafnium compounds; plasma deposition; plasma interactions; titanium compounds; MOSFET; TiN-HfSiO4; comb antennas; dielectric breakdown; pMOSFET; plasma assisted deposition processes; plasma induced damage; plate antenna structures; titanium nitride/hafnium silicate stack; transient charge trapping; Boron; Degradation; Hafnium; MOSFETs; Plasma applications; Plasma devices; Plasma materials processing; Plasma sources; Shape control; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. 2005 IEEE International
  • Print_ISBN
    0-7803-8803-8
  • Type

    conf

  • DOI
    10.1109/RELPHY.2005.1493119
  • Filename
    1493119
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1651851