DocumentCode :
1652668
Title :
Technology Migration Techniques for Simplified Layouts with Restrictive Design Rules
Author :
Tang, Xiaoping ; Yuan, Xin
Author_Institution :
IBM TJ Watson Res., Yorktown Heights, NY
fYear :
2006
Firstpage :
655
Lastpage :
660
Abstract :
Designs using simple geometric layout objects (such as points, sticks and rectangles) with restrictive design rules (RDRs) on each layout object (i.e., it must be placed on a set of grids subject to a set of ground rules) have been introduced as an approach to better enable design for manufacturability (DFM) in ultra-deep submicron designs (Lavin et al., 2004). In this paper, we study the problem of migrating the conventional shape-based layouts to the simplified layouts with RDR constraints. We present a migration flow which consists of two process steps: (1) conversion where shapes (such as polygons) are converted to simple geometric objects (such as sticks) while the topology is maintained; and (2) grid legalization for RDRs where the simple geometric objects are placed on grid subject to the given set of ground rules by using a novel legalization algorithm, the minimum perturbation-driven graph-based grid legalization (MP-GGL) algorithm. We demonstrate the effectiveness of the flow by successfully migrating a set of library cells in the conventional shape-based technology to the simplified layouts with RDR constraints
Keywords :
design for manufacture; graph theory; linear programming; perturbation techniques; conventional shape-based technology; design for manufacturability; geometric layout objects; ground rules; migration flow; minimum perturbation-driven graph-based grid legalization algorithm; restrictive design rules; shape-based layouts; simplified layouts; technology migration; ultra-deep submicron designs; Compaction; Design for manufacture; Integer linear programming; Libraries; Manufacturing processes; Process design; Productivity; Shape; Topology; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Computer-Aided Design, 2006. ICCAD '06. IEEE/ACM International Conference on
Conference_Location :
San Jose, CA
ISSN :
1092-3152
Print_ISBN :
1-59593-389-1
Electronic_ISBN :
1092-3152
Type :
conf
DOI :
10.1109/ICCAD.2006.320032
Filename :
4110248
Link To Document :
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