DocumentCode :
165455
Title :
Fabrication of Silicon thin film by metal-assisted chemical etching
Author :
Song-Ting Yang ; Chien-Ting Liu ; Thiyagu, Subramani ; Chen-Chih Hsueh ; Ching-Fuh Lin
Author_Institution :
Grad. Inst. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
fYear :
2014
fDate :
18-21 Aug. 2014
Firstpage :
799
Lastpage :
800
Abstract :
We fabricate a Silicon thin film by metal-assisted chemical etching (MacEch). Generally, it is hard to make a large size silicon thin film. Here we demonstrate a low cost and simple method to lift off the silicon thin film from silicon wafer. Besides, the substrate is reusable, so we can fabricate many thin films from the same wafer. Thus, this method is competitive for commercial applications.
Keywords :
elemental semiconductors; etching; semiconductor growth; semiconductor thin films; silicon; Si; commercial application; metal-assisted chemical etching; reusable substrate; silicon thin film; silicon wafer; Chemicals; Educational institutions; Electrical engineering; Etching; Photovoltaic cells; Resists; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology (IEEE-NANO), 2014 IEEE 14th International Conference on
Conference_Location :
Toronto, ON
Type :
conf
DOI :
10.1109/NANO.2014.6967974
Filename :
6967974
Link To Document :
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