DocumentCode :
1654790
Title :
High-performance negative electron affinity photocathodes for high resolution electron beam lithography and metrology
Author :
Baum, A.W. ; Schneider, J.E. ; Pease, R.F.W.
Author_Institution :
Solid State Electron. Lab., Stanford Univ., CA, USA
fYear :
1995
Firstpage :
409
Lastpage :
412
Abstract :
Factors affecting the brightness of negative electron affinity photocathodes have been investigated experimentally and theoretically. The results of a two-dimensional model of electron dynamics in the cathode, including the effects of surface-trapped electrons, are presented. Emission is seen to be cut off in the central emission area at high current levels. The angular distribution is compared to a cosine distribution based on an energy spectrum obtained from the same cathode. While superior to the cosine distribution with respect to its forward focusing properties, it is far wider than previous theory has suggested
Keywords :
brightness; electron affinity; electron beam lithography; photocathodes; angular distribution; brightness; cosine distribution; electron beam lithography; electron dynamics; energy spectrum; focusing; high resolution metrology; negative electron affinity photocathodes; surface-trapped electrons; two-dimensional model; Brightness; Cathodes; Current density; Electron beams; Electron emission; Electron traps; Elementary particle vacuum; Gallium arsenide; Infrared detectors; Laser beams;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1995. IEDM '95., International
Conference_Location :
Washington, DC
ISSN :
0163-1918
Print_ISBN :
0-7803-2700-4
Type :
conf
DOI :
10.1109/IEDM.1995.499226
Filename :
499226
Link To Document :
بازگشت