DocumentCode :
1654839
Title :
Device drive current degradation observed with retrograde channel profiles
Author :
Venkatesan, S. ; Lutze, J.W. ; Lage, C. ; Taylor, W.J.
Author_Institution :
Adv. Products Res. & Dev. Lab., Motorola Inc., Austin, TX, USA
fYear :
1995
Firstpage :
419
Lastpage :
422
Abstract :
Super steep retrograde channel profiles have been widely known to produce improved short channel characteristics in sub-0.35 μm CMOS technologies. In this paper, an attempt is made to leverage this improved short channel behaviour and thereby improve transistor performance (as measured by the current drive). Whereas significant improvements in short channel effects measured by DIBL and ΔVtsat are obtained with retrograde channels, it is observed that for a fixed gate length and equal threshold voltage, transistors with retrograde channel profiles typically exhibit lower drive currents than equivalent transistors fabricated with conventional doping profiles. Potential trade offs in device design resulting from this observation are discussed
Keywords :
MOSFET; doping profiles; semiconductor doping; 0.35 micron; CMOS transistor; DIBL; device design; doping profile; drive current; short channel characteristics; super steep retrograde channel profile; threshold voltage; Annealing; Degradation; Doping profiles; Indium; Laboratories; Length measurement; MOS devices; Performance evaluation; Research and development; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1995. IEDM '95., International
Conference_Location :
Washington, DC
ISSN :
0163-1918
Print_ISBN :
0-7803-2700-4
Type :
conf
DOI :
10.1109/IEDM.1995.499228
Filename :
499228
Link To Document :
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