DocumentCode :
1655264
Title :
The implications of self-consistent current density design guidelines comprehending electromigration and Joule heating for interconnect technology evolution
Author :
Hunter, William R.
Author_Institution :
Texas Instrum. Inc., Dallas, TX, USA
fYear :
1995
Firstpage :
483
Lastpage :
486
Abstract :
We comprehend both electromigration and Joule heating to study for the first time the self-consistent solutions for the maximum allowed interconnect peak current density jpeak Using worst-case heat losses, we show how these solutions can be used to generate adequately safe current density design guidelines. They indicate that thermal effects will dominate the ability to increase jpeak, rather than EM capability of an interconnect system. Further increases in jpeak will have to come at some future time from technology options which lower the temperature at which the interconnect operates
Keywords :
current density; electromigration; integrated circuit design; integrated circuit interconnections; integrated circuit metallisation; integrated circuit reliability; temperature distribution; Joule heating; electromigration; interconnect technology; multilevel metal; self-consistent current density design guidelines; single level self consistent theory; thermal effects; worst-case heat losses; Current density; Electromigration; Equations; Guidelines; Heating; Instruments; Lead; Temperature dependence; Thermal conductivity; Thermal resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1995. IEDM '95., International
Conference_Location :
Washington, DC
ISSN :
0163-1918
Print_ISBN :
0-7803-2700-4
Type :
conf
DOI :
10.1109/IEDM.1995.499243
Filename :
499243
Link To Document :
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