Title : 
Electronics and photonics prototype devices based on compound semiconductor nanowires/nanobelts
         
        
            Author : 
Dai, L. ; Qin, G.G.
         
        
            Author_Institution : 
Dept. of Phys., Peking Univ., Beijing, China
         
        
        
        
        
            Abstract : 
We present synthesis and in-situ doping of several important n-type and p-type compound semiconductor 1D nanomaterials via the chemical vapor deposition method, and the nanoelectronic and nanophotonic prototype devices based on these nanomaterials. Various high performance nanoelectronic devices, including metal-insulator-semiconductor field-effect transistors (FETs), metal-semiconductor FETs, and NOT, NOR and NAND logic gates based on FETs, have been fabricated and studied. Various NW (NB)/p+-Si heterojunction electroluminescence devices have been fabricated and studied. CdS NW ring cavities were fabricated and a straight CdS NW with Fabry-Perot cavity structure was employed to couple the light out from the ring cavity.
         
        
            Keywords : 
II-VI semiconductors; MISFET; cadmium compounds; electroluminescent devices; elemental semiconductors; logic gates; nanobelts; nanowires; semiconductor doping; silicon; wide band gap semiconductors; CdS; Fabry-Perot cavity structure; NAND logic gates; NOR logic gates; NOT logic gates; Si; chemical vapor deposition; compound semiconductor nanowires/nanobelts; electroluminescence devices; electronics prototype device; in-situ doping; metal-insulator-semiconductor field-effect transistors; metal-semiconductor FET; nanoelectronic devices; photonics prototype device; semiconductor 1D nanomaterials; Chemical vapor deposition; FETs; Logic gates; Metal-insulator structures; Nanomaterials; Nanoscale devices; Nanowires; Photonics; Prototypes; Semiconductor device doping;
         
        
        
        
            Conference_Titel : 
Nanoelectronics Conference (INEC), 2010 3rd International
         
        
            Conference_Location : 
Hong Kong
         
        
            Print_ISBN : 
978-1-4244-3543-2
         
        
            Electronic_ISBN : 
978-1-4244-3544-9
         
        
        
            DOI : 
10.1109/INEC.2010.5424469