Title :
Low-loss and high contrast silicon-on-insulator (SOI) arrayed waveguide grating
Author :
Cheung, S.T.S. ; Guan, B. ; Djordjevic, S.S. ; Okamoto, K. ; Yoo, S.J.B.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of California, Davis, CA, USA
Abstract :
We report high-extinction and low-loss 40-channel × 100-GHz arrayed waveguide grating (AWG) fabricated on silicon-on-insulator using high quality etching condition resulting in <; 0.8 dB/cm loss and low phase errors.
Keywords :
diffraction gratings; integrated optics; laser beam etching; optical losses; silicon-on-insulator; arrayed waveguide grating; high quality etching condition; high-extinction; low phase errors; low-loss high contrast silicon-on-insulator; Arrayed waveguide gratings; Loss measurement; Plasmas; Resists; Silicon; Waveguide discontinuities;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2012 Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4673-1839-6
